Materials
The Inventors of CeMnO Ferroelectric Technology
SMI has developed CVD processes for a wide range of oxide materials and implemented them in both simple and complex multilayer structures. The figure below shows the diverse and growing range of materials actually deposited (green highlights) and compatible (yellow highlights) with our film growth technology.
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In practice, if it is on the chart and a precursor (a vaporizable compound) exists for the material, then we can produce a process to deposit it.
In the table below we list many of the applications that SMI CVD tools have produced materials for.
The SMI broad experience base in materials makes SMI an ideal choice for teaming with customers to provide answers to their research or product needs.
Please contact SMI at sales@structuredmaterials.com with any questions and we will work with you to provide the best solutions to your deposition needs.
Oxides
Si, SiGe, SiGeC, SiGeSn, SiGeSnC, etc. for batteries
Si, SiGe, SiGeC, SiGeSn, SiGeSnC, etc. for thermoelectrics
III-Vs (arsenides, phosphide, antimonides, etc.)
II-VIs (
Carbides (SiC, Metal carbides)