Chemical Vapor Deposition (CVD) and Themral Decomposition (TD) of SiC (also called silicon sublimation) are production scalable techniques of producting graphene. CVD is widely used in the semiconductor industry for research and for production of microscale devices and large area technologies such as photovoltaics and displays.
Graphene
MATERIALS
Oxides
TCOs
ZnO
YBCO, Superconductors
Ga2O3
LaAlO
BST
PZT
CMO
Al2O3
Ti2O3
Ta2O5
LiNbO3
Many others
Nanowires
Si, SiGe, SiGeC, SiGeSn, SiGeSnC, etc. for batteries
Si, SiGe, SiGeC, SiGeSn, SiGeSnC, etc. for thermoelectrics
CNTs
ZnO
GaN
Many others
Chalcogenides
MoS2, WSe2, etc.
GeS, CuS, GeSiTe, etc.
III-Vs (arsenides, phosphide, antimonides, etc.)
II-VIs (
Nitrides (GaN, AlN, InN, BN)
Carbides (SiC, Metal carbides)
Diamond
Silicon / Silicides (Si, SiGe, SiGeSn)
Other
