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SMI has developed a wide range of heating elements and heating control assemblies that can produce substrate temperatures from RT to 1400°C in reducing atmosphere and through 900°C in oxidizing atmosphere. This includes heating elements for rotating disk reactors in an array of processing gas environments. However, our focus is on oxide environments where we have demonstrated 99% temperature uniformity. In addition, to symetric heaters we also work with linear or complex shape heaters and custom designed heaters.
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