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Components for CVD, PECVD, MOCVD, ALD and HVPE Depostion Tools - for New Builds, Legacy, and End of Life Equipment
CVD processes encompass a great number of materials, process environments, and process chemistries. The environment can include inert, reducing, oxidizing, or other atmospheres; the temperatures can vary greatly from room temperatures to about 2400 deg C; temperature can vary greatly from low pressures (<10^-6 atm to greater than a few atmospheres), the process chemically can also create acids and bases. Plasma and associated excited and reactive species may also be present. Thus depending on the materials and process parameters, a very wide range of heating methods may be called upon. SMI has implemented a great range of heating approaches including filaments Graphite, Tungster, Hastelloy, MoS2, SiC, lamps, induction, and even direct current resistance heating of the material as in a tape.
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